Add units

ViennaTools · Feb 3, 2025 · 4ac7ab2 · 4ac7ab2
1 parent f128aa5
commit 4ac7ab2
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Showing 6 changed files with 414 additions and 50 deletions.
diff --git a/examples/holeEtching/config.txt b/examples/holeEtching/config.txt
@@ -2,32 +2,34 @@
 
 # all length units are in micrometers (um)
 # Domain
-gridDelta=4.0 # um
-xExtent=100.0 # um
-yExtent=100.0 # um
+lengthUnit=um
+gridDelta=0.03  # um
+xExtent=1.0     # um
+yExtent=1.0     # um
 
 # Geometry
-holeRadius=20.0 # um
-maskHeight=65.0 # um
-taperAngle=1.5  # degree
+holeRadius=0.175  # um
+maskHeight=1.2    # um
+taperAngle=1.193  # degree
 
 # Process parameters
-processTime=50 # seconds 
+processTime=3
+timeUnit=min
 
 # all flux values are units 1e15 / cm²
 ionFlux=10.
-etchantFlux=500.
-oxygenFlux=200.
+etchantFlux=3000.
+oxygenFlux=1500.
 
 ionExponent=200
 meanEnergy=100 # eV
 sigmaEnergy=10 # eV
-A_O=3 # passivation layer yield constant
-A_Si=7 # Si yield constant
+A_O=2          # passivation layer yield constant
+A_Si=7         # Si yield constant
 
-etchStopDepth=-1000 # maximum etching depth
-integrationScheme=EO_1
+etchStopDepth=-10   # maximum etching depth
+integrationScheme=EO_1 
 
 raysPerPoint=1000
 
-outputFile=final
+outputFile=final_y0p62
diff --git a/examples/holeEtching/holeEtching.cpp b/examples/holeEtching/holeEtching.cpp
@@ -8,9 +8,9 @@ namespace ps = viennaps;
 
 int main(int argc, char *argv[]) {
   using NumericType = double;
-  constexpr int D = 3;
+  constexpr int D = 2;
 
-  ps::Logger::setLogLevel(ps::LogLevel::INTERMEDIATE);
+  ps::Logger::setLogLevel(ps::LogLevel::INFO);
   omp_set_num_threads(16);
 
   // Parse the parameters
@@ -35,8 +35,7 @@ int main(int argc, char *argv[]) {
       .apply();
 
   // use pre-defined model SF6O2 etching model
-  auto model = ps::SmartPointer<ps::SF6O2Etching<NumericType, D>>::New();
-  auto &modelParams = model->getParameters();
+  ps::SF6O2Parameters<NumericType> modelParams;
   modelParams.ionFlux = params.get("ionFlux");
   modelParams.etchantFlux = params.get("etchantFlux");
   modelParams.oxygenFlux = params.get("oxygenFlux");
@@ -46,6 +45,11 @@ int main(int argc, char *argv[]) {
   modelParams.Passivation.A_ie = params.get("A_O");
   modelParams.Si.A_ie = params.get("A_Si");
   modelParams.etchStopDepth = params.get("etchStopDepth");
+  auto model =
+      ps::SmartPointer<ps::SF6O2Etching<NumericType, D>>::New(modelParams);
+
+  ps::units::Length::setUnit(params.get<std::string>("lengthUnit"));
+  ps::units::Time::setUnit(params.get<std::string>("timeUnit"));
 
   // process setup
   ps::Process<NumericType, D> process;

diff --git a/include/viennaps/models/psSF6O2Etching.hpp b/include/viennaps/models/psSF6O2Etching.hpp
@@ -7,6 +7,7 @@
 #include "../psConstants.hpp"
 #include "../psProcessModel.hpp"
 #include "../psSurfaceModel.hpp"
+#include "../psUnits.hpp"
 #include "../psVelocityField.hpp"
 
 namespace viennaps {
@@ -142,16 +143,22 @@ class SF6O2SurfaceModel : public SurfaceModel<NumericType> {
           eCoverage->at(i) * ionEnhancedFlux->at(i) * params.ionFlux;
       const auto chemicalRate = params.Si.k_sigma * eCoverage->at(i) / 4.;
 
+      // The etch rate is calculated in nm/s
+      const double unitConversion =
+          units::Time::getInstance().convertSecond() /
+          units::Length::getInstance().convertNanometer();
+
       if (MaterialMap::isMaterial(materialIds[i], Material::Mask)) {
-        etchRate[i] = -(1 / params.Mask.rho) * sputterRate;
+        etchRate[i] = -(1 / params.Mask.rho) * sputterRate * unitConversion;
         if (Logger::getLogLevel() > 3) {
           spRate->at(i) = sputterRate;
           ieRate->at(i) = 0.;
           chRate->at(i) = 0.;
         }
       } else {
-        etchRate[i] = -(1 / params.Si.rho) * (chemicalRate + sputterRate +
-                                              ionEnhancedRate); // in um / s
+        etchRate[i] = -(1 / params.Si.rho) *
+                      (chemicalRate + sputterRate + ionEnhancedRate) *
+                      unitConversion;
         if (Logger::getLogLevel() > 3) {
           spRate->at(i) = sputterRate;
           ieRate->at(i) = ionEnhancedRate;
@@ -271,19 +278,19 @@ class SF6O2Ion
       Eth_sp = params.Mask.Eth_sp;
     }
 
-    NumericType f_sp_theta =
-        std::max((1 + B_sp * (1 - cosTheta * cosTheta)) *
-                     std::cos(angle / params.Si.theta_g_sp * M_PI_2),
-                 0.);
-    NumericType f_ie_theta =
-        std::max((1 + params.Si.B_ie * (1 - cosTheta * cosTheta)) *
-                     std::cos(angle / params.Si.theta_g_ie * M_PI_2),
-                 0.);
-    // NumericType f_sp_theta = 1.;
-    // NumericType f_ie_theta = 1.;
-    // if (cosTheta < 0.5) {
-    //   f_ie_theta = std::max(3 - 6 * angle / M_PI, 0.);
-    // }
+    // NumericType f_sp_theta =
+    //     std::max((1 + B_sp * (1 - cosTheta * cosTheta)) *
+    //                  std::cos(angle / params.Si.theta_g_sp * M_PI_2),
+    //              0.);
+    // NumericType f_ie_theta =
+    //     std::max((1 + params.Si.B_ie * (1 - cosTheta * cosTheta)) *
+    //                  std::cos(angle / params.Si.theta_g_ie * M_PI_2),
+    //              0.);
+    NumericType f_sp_theta = 1.;
+    NumericType f_ie_theta = 1.;
+    if (cosTheta < 0.5) {
+      f_ie_theta = std::max(3 - 6 * angle / M_PI, 0.);
+    }
 
     const double sqrtE = std::sqrt(E);
     NumericType Y_sp =
@@ -339,14 +346,14 @@ class SF6O2Ion
       NewEnergy = normalDist(Rng);
     } while (NewEnergy > E || NewEnergy < 0.);
 
-    // NumericType sticking = 0.;
-    NumericType sticking = 1.;
-    if (incAngle > params.Ions.thetaRMin) {
-      sticking =
-          1. - std::min((incAngle - params.Ions.thetaRMin) /
-                            (params.Ions.thetaRMax - params.Ions.thetaRMin),
-                        NumericType(1.));
-    }
+    NumericType sticking = 0.;
+    // NumericType sticking = 1.;
+    // if (incAngle > params.Ions.thetaRMin) {
+    //   sticking =
+    //       1. - std::min((incAngle - params.Ions.thetaRMin) /
+    //                         (params.Ions.thetaRMax - params.Ions.thetaRMin),
+    //                     NumericType(1.));
+    // }
 
     // Set the flag to stop tracing if the energy is below the threshold
     if (NewEnergy > params.Si.Eth_ie) {

diff --git a/include/viennaps/psProcess.hpp b/include/viennaps/psProcess.hpp
@@ -2,6 +2,7 @@
 
 #include "psProcessModel.hpp"
 #include "psTranslationField.hpp"
+#include "psUnits.hpp"
 #include "psUtils.hpp"
 
 #include <lsAdvect.hpp>
@@ -677,7 +678,8 @@ template <typename NumericType, int D> class Process {
         std::stringstream stream;
         stream << std::fixed << std::setprecision(4)
                << "Process time: " << processDuration - remainingTime << " / "
-               << processDuration;
+               << processDuration << " "
+               << units::Time::getInstance().toStringShort();
         Logger::getInstance().addInfo(stream.str()).print();
       }
     }